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Polished-Surface Al2O3 Ceramic Wafer Chuck Mirror Finish Alumina Vacuum Grade for Semiconductor Processing Equipment

Name: Polished-Surface Al2O3 Ceramic Wafer Chuck Mirror Finish Alumina Vacuum Grade for Semiconductor Processing Equipment
Brand: Wuxi Special Ceramic Electrical Co.,Ltd
SKU: WS-AL-PS14
Price: 95.00 USD
Availability: InStock

Rincian produk

Tempat asal: Jiangsu, Tiongkok

Nama merek: Wuxi Special Ceramic

Sertifikasi: ISO 9001:2015

Nomor model: WS-AL-PS14

Syarat Pembayaran & Pengiriman

Kuantitas min Order: 10 buah

Harga: US$10~US$180/Piece

Kemasan rincian: Karton kelas ekspor dengan sisipan busa, dibuat dalam palet untuk angkutan laut atau udara

Waktu pengiriman: 15-30 hari setelah konfirmasi

Syarat-syarat pembayaran: T/T, L/C, Western Union

Menyediakan kemampuan: 100.000 lembar per bulan

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Deskripsi Produk

Menyoroti: 
                                                                                                                                                                                                                                                                                                                Polished Alumina Wafer Chuck, Mirror Finish Ceramic Part, Semiconductor Processing Equipment
                              

Konten alumina:	99,5% Al2O3	Permukaan Selesai:	Cermin dipoles
Kekasaran permukaan:	Ra 0,02 um	Tingkat Kemurnian:	Kelas Vakum
Kepadatan:	3,92 gram/cm3	Warna:	Gading
Aplikasi:	Peralatan pengolahan semikonduktor	suhu penggunaan maksimal:	1700 derajat C

Konten alumina:	99,5% Al2O3
Permukaan Selesai:	Cermin dipoles
Kekasaran permukaan:	Ra 0,02 um
Tingkat Kemurnian:	Kelas Vakum
Kepadatan:	3,92 gram/cm3
Warna:	Gading
Aplikasi:	Peralatan pengolahan semikonduktor
suhu penggunaan maksimal:	1700 derajat C

Polished-Surface Al2O3 Ceramic Wafer Chuck Mirror Finish Alumina Vacuum Grade for Semiconductor Processing Equipment

In semiconductor processing, the surface that touches the wafer must be perfect: smooth enough to avoid particle trapping, clean enough to avoid contamination, and stable enough to hold wafers flat at process temperature. Our Polished-Surface Al2O3 Ceramic Wafer Chucks are pressed and sintered from vacuum grade 99.5% alumina, then ground and polished to a mirror finish with roughness down to 0.02 microns Ra. The dense, non-porous surface releases wafers cleanly, resists the

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Keramik Al2O3

Keramik Steatite

Keramik Silicon Nitride

Keramik Zirkonia

perahu penguapan keramik

Keramik Silicon Carbide

Keramik Cordierite

Keramik Mullite

Substrat Keramik

Keramik Boron Nitrida

Poros Keramik

Nosel keramik

Keramik Zirkonium Oksida

Keramik Macor

keramik semikonduktor

Pisau Keramik Zirkonia

bubuk Y2O3

Keramik Aluminium Nitrida

Keramik Metalized

Polished-Surface Al2O3 Ceramic Wafer Chuck Mirror Finish Alumina Vacuum Grade for Semiconductor Processing Equipment

Polished Alumina Wafer Chuck

Mirror Finish Ceramic Part

Semiconductor Processing Equipment

Plat Keramik Alumina,

Plat Keramik Al2o3,

Keramik Al2O3

Keramik Steatite

Keramik Silicon Nitride

Keramik Zirkonia

perahu penguapan keramik

Keramik Silicon Carbide

Keramik Cordierite