Produk

Rumah > Produk > Keramik Al2O3 > High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts

Kategori

Keramik Metalized

(10)

Kontak

Kontak: Miss. Zhu

Telp: 17351500728

Hubungi Sekarang

Kirimkan surat.

High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts

Name: High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts
Brand: Wuxi Special Ceramic Electrical Co.,Ltd
SKU: WS-AL-HP02
Price: 105.00 USD
Availability: InStock

Rincian produk

Tempat asal: Jiangsu, Tiongkok

Nama merek: Wuxi Special Ceramic

Sertifikasi: ISO 9001:2015

Nomor model: WS-AL-HP02

Syarat Pembayaran & Pengiriman

Kuantitas min Order: 10 buah

Harga: US$10~US$200/Piece

Kemasan rincian: Karton kelas ekspor dengan sisipan busa, dibuat dalam palet untuk angkutan laut atau udara

Waktu pengiriman: 15-30 hari setelah konfirmasi

Syarat-syarat pembayaran: T/T, L/C, Western Union

Menyediakan kemampuan: 100.000 lembar per bulan

Dapatkan Harga Terbaik

Rincian produk

Deskripsi Produk

Menyoroti: 
                                                                                                                                                                                                                                                                                                                                                High Purity Alumina Susceptor, Semiconductor Grade Ceramic Plate, Wafer Processing Equipment Part
                              

Konten alumina:	99,5% Al2O3	Tingkat Kemurnian:	Kelas Semikonduktor
Kepadatan:	3,92 gram/cm3	Kekasaran permukaan:	Ra 0,1-0,4 um
Kebosanan:	0,02 mm	Warna:	Gading
Aplikasi:	peralatan pemrosesan wafer	suhu penggunaan maksimal:	1700 derajat C
Fitur:	Kontaminasi Ion Rendah

Konten alumina:	99,5% Al2O3
Tingkat Kemurnian:	Kelas Semikonduktor
Kepadatan:	3,92 gram/cm3
Kekasaran permukaan:	Ra 0,1-0,4 um
Kebosanan:	0,02 mm
Warna:	Gading
Aplikasi:	peralatan pemrosesan wafer
suhu penggunaan maksimal:	1700 derajat C
Fitur:	Kontaminasi Ion Rendah

High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts

Semiconductor wafer processing demands materials that neither shed particles nor leach metallic contamination into the process environment. Our High-Purity Al2O3 Ceramic Susceptor Plates are manufactured from 99.5% alpha alumina with tightly controlled trace element levels, then fired in a clean production line to produce a fully dense, pore-free body that stays chemically silent even under plasma and high bias conditions. Each plate is diamond ground and lapped to a flatness

Tags:

Keramik Al2O3

Keramik Steatite

Keramik Silicon Nitride

Keramik Zirkonia

perahu penguapan keramik

Keramik Silicon Carbide

Keramik Cordierite

Keramik Mullite

Substrat Keramik

Keramik Boron Nitrida

Poros Keramik

Nosel keramik

Keramik Zirkonium Oksida

Keramik Macor

keramik semikonduktor

Pisau Keramik Zirkonia

bubuk Y2O3

Keramik Aluminium Nitrida

Keramik Metalized

High-Purity Al2O3 Ceramic Susceptor Plates Semiconductor Grade for Wafer Processing Equipment Parts

High Purity Alumina Susceptor

Semiconductor Grade Ceramic Plate

Wafer Processing Equipment Part

Plat Keramik Alumina,

Plat Keramik Al2o3,

Keramik Al2O3

Keramik Steatite

Keramik Silicon Nitride

Keramik Zirkonia

perahu penguapan keramik

Keramik Silicon Carbide

Keramik Cordierite